Application of Atomic Layer Deposition in Dye-Sensitized Photoelectrosynthesis Cells

نویسندگان

چکیده

In dye-sensitized photoelectrosynthesis cells (DSPECs) for water splitting or reduction of CO2, the most important figures merit are cell efficiency and stability. Maximizing these values requires use complex surface structures to perform key chemical reactions. The latter require a high level integrated research with focus on formation stabilization molecular both photoanodes photocathodes. Surface kinetics play element in dictating DSPEC efficiencies their control demands systematic design controlled local structures. ALD has been remarkably useful this area. It used fabrication core/shell structures, such as SnO2/TiO2 photoanodes, which greatly enhance charge separation significantly enhanced compared traditional TiO2 electrodes. extended form overlayer inert oxides preformed that lead stabilized impact resulting can have stability be profound, leading highly significant enhancement reactivity implications long-term catalysis. role significant. provided low-temperature, bottom-up approach creation chromophore/catalyst assemblies an increasingly electrodes interfacial energy conversion. Atomic layer deposition (ALD) extensively modification semiconductor surfaces scientific industrial applications. employs labile organometallic precursors add layers solids vacuum subsequently activated by hydrolysis. recent applications, it preparation molecularly based solar (DSSCs) This review focuses applications DSPECs fuels modified surfaces. area, prepare modify surface-interfacial electron transfer, stabilize surface-bound chromophores catalysts, oxidation photocathodes H2 CO2 reduction.

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ژورنال

عنوان ژورنال: Trends in chemistry

سال: 2021

ISSN: ['2589-5974', '2589-7209']

DOI: https://doi.org/10.1016/j.trechm.2020.11.002